Beilstein J. Nanotechnol.2018,9, 1573–1581, doi:10.3762/bjnano.9.149
of a solvent were found to be superior for most nanoimprint applications. A large dispersion of the samples was found.
Keywords: nanoimprint; orientedgradient; photoresist; polymer; replica; Introduction
Although the basic principles behind nanoimprint lithography (NIL) have been known for many
PDF
Figure 1:
Two-step fabrication of samples. The left column shows three pictures taken at different angles of ...